Improvement on the conventional MWECR-CVD system and preparation of hydrogenated amorphous silicon films

In order to obtain a compact-structure, saving-energy and good-property system based on the conventional microwave electron-cyclotron resonance chemical vapor deposition (MWECR-CVD) system, we proposed a new technique using a magnetic field combination of an electromagnetic coil and a permanent magnet unit, as well as adopting a dedicated microwave coupling structure. The experiment results showed that by using this new optimized system the deposition rate can reach more than 2.5 nm/s, and the photosensitivity of a-Si:H films can be up to 1.1×105.