Direct calorimetric measurements in a PBII and deposition (PBII&D) experiment with a HiPIMS plasma source

To allow direct calorimetric measurement of a high voltage pulsed substrate, a common passive thermal probe (PTP) was modified utilizing a fiber optic temperature sensor. With this probe, the effect of PBII voltage, substrate distance and pressure, on the energy flux and ion current towards the PBII substrate was investigated as a function of the delay between HiPIMS and PBII pulse. The results were successfully compared to a basic model and revealed important information regarding substrate position, process pressure and the effect of secondary electrons in this combined system.