کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
11008878 | 1840429 | 2019 | 40 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
YSZ/GDC bilayer and gradient barrier layers deposited by reactive magnetron sputtering for solid oxide cells
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
In this work, the ability to use the magnetron sputtering deposition technique to synthesize YSZ electrolyte and GDC barrier layer for a solid oxide cell is studied. A particular attention is paid to optimize the YSZ/GDC interface in order to promote adhesion between the layers and the global ionic conductivity. First successive deposition of YSZ and GDC is investigated which leads to the formation of bilayer structure. Then co-deposition of both compounds is carried out in order to obtain a chemical composition gradient, ensuring a smooth transition from the electrolyte to the barrier layer. The potential use of those deposits in solid oxide cell is evaluated after annealing at 1100â¯Â°C for 3â¯h in air. Finally, cells with bilayer or gradient deposits are tested at a temperature of 800â¯Â°C and at a reactive gas flow rate of 24â¯Nâ¯mL·minâ1·cmâ2 on the hydrogen side of the cell. A power density of 0.94â¯W·cmâ2 at 700â¯mV in SOFC mode and a current density of â1.4â¯A·cmâ2 at 1.3â¯V in HTE mode are obtained.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 357, 15 January 2019, Pages 103-113
Journal: Surface and Coatings Technology - Volume 357, 15 January 2019, Pages 103-113
نویسندگان
Pierre Coddet, Marie-Lyne Amany, Julien Vulliet, Amael Caillard, Anne-Lise Thomann,