کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
11029544 | 1646497 | 2018 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The effect of the interfacial states by swift heavy ion induced atomic migration in 4H-SiC Schottky barrier diodes
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
The effects of the atomic migration between metal and semiconductor by swift heavy ion (SHI) irradiation on the turn on voltage (Von), ideality factor (n) and Schottky barrier height (SBH) in 4H-SiC Schottky barrier diodes (SBD) have been researched. The results show that the n decreases and SBH increases for 4H-SiC SBDs without irradiation and with 5â¯Ãâ¯109â¯ions/cm2 at increasing testing temperature. After irradiation, the Von and SBH of the sample increases due to the forming of higher barrier height TiSix by annealing treatment at 873â¯K. The SHI and annealing treatment can make the deep level defect to be partly recovered. The results may be explained that the interfacial structure was modified due to the silicon and carbon atomic migration during SHI process at the interfacial region between metal and semiconductor, and then reacting at high temperature annealing treatment.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 436, 1 December 2018, Pages 244-248
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 436, 1 December 2018, Pages 244-248
نویسندگان
Zhimei Yang, Fan Lan, Yun Li, Min Gong, Mingmin Huang, Bo Gao, Junkui Hu, Yao Ma,