کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1232610 | 1495282 | 2012 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی آنالیزی یا شیمی تجزیه
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar Sticking probability of CN(X2Σ+) radicals onto amorphous carbon nitride films formed from the decomposition of BrCN induced by the microwave discharge flow of Ar](/preview/png/1232610.png)
چکیده انگلیسی
⺠The sticking probability, s, of CN(X2Σ+) radicals onto amorphous carbon nitride films were evaluated under various experimental conditions based on the CN(A2Î i â X2Σ+) laser-induced fluorescence spectra. ⺠The s values were in the range of 7.6 Ã 10â2 to 23 Ã 10â2. ⺠The variation of s was interpreted in terms of the etching of the deposited films induced by the collision of Ar+ and of the hydrogen-abstraction reaction of CN(X2Σ+) radicals from the film surface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy - Volume 86, February 2012, Pages 256-265
Journal: Spectrochimica Acta Part A: Molecular and Biomolecular Spectroscopy - Volume 86, February 2012, Pages 256-265
نویسندگان
Haruhiko Ito, Hitoshi Araki, Akira Wada, Ayumi Yamamoto, Tsuneo Suzuki, Hidetoshi Saitoh,