Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from β-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 °C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising.

► AA-CVD used to prepare YSZ thin films for SOFC electrolyte applications.
► Smooth thin films of controlled thickness and stoichiometry, cost-effective.
► Low deposition temperatures between 300 and 650 °C.
► Amorphous, nanocrystalline or columnar microstructure can be obtained.
► Transition from surface reaction to diffusion controlled growth regime at 400 °C.