Preparation of YSZ films by magnetron sputtering for anode-supported SOFC

YSZ films for anode-supported SOFCs were prepared by reactive sputtering method. It was found that the surface morphology of anode substrate has a very important effect on the quality of sputtered films. By applying an anode functional layer and making the anode surface smooth, dense and uniform YSZ films of 10 µm in thickness were successfully fabricated. The sintering behaviors of the sputtered YSZ films were also discussed. It is suggested that the optimized densification condition for the deposited YSZ films is sintering at 1250 °C for 4 h. Single cells with sputtered YSZ film as electrolyte and LSM–YSZ as active cathode materials were tested. 1.08 V open circuit voltage and a 700 mW/cm2 maximum power density were achieved at 750 °C by using humidified H2 as fuel and air as oxidant.