Growth of carbon nanotubes on glass substrate by MPECVD

We have grown carbon nanotubes (CNTs) with a microwave plasma-enhanced chemical vapor deposition (MPECVD) method, which has been regarded as one of the most promising candidates for the synthesis of CNTs due to the vertical alignment, the low temperature and the large area growth. We had used methane (CH4) and hydrogen (H2) gas for the growth of CNTs. 10-nm-thick Ni catalytic layer were deposited on the Ti-coated glass substrate by RF magnetron sputtering method. In this work, we report the low-temperature growing properties of the CNTs on glass substrate with a MPECVD. We have pretreated the Ni/Ti/glass catalytic layer in different microwave power (600, 700, 800, and 900 W) and grown the CNTs in the same microwave power (800 W). SEM (Scanning electron microscopy) images of the Ni catalytic layer shows the diameter and density variation to be dependent with the pretreatment conditions. Raman spectroscopy of CNTs shows that the synthesized CNTs were multi-wall CNTs.