The changes in structural and optical properties of (ZnO:AlN) thin films fabricated at different RF powers of ZnO target

AlN doped ZnO thin films were prepared on glass and Si (100) substrates by RF sputtering. The ratio of nitrogen (N2) to Argon (Ar) used to prepare the films was 80:20. The films were deposited at different RF powers of 150 W, 175 W, 200 W, 225 W and 250 W for ZnO target and 200 W for AlN target. XRD results revealed the existence of (002) ZnO phase for RF power of ZnO target above 175 W. However, at the RF power of 150 W, the film exhibited amorphous properties. The prepared films showed transmission values above 70% in the visible range. The average calculated value of energy band gap and the refractive index were 3.43 eV and 2.29 respectively. The green and UV emission peaks were observed from PL spectra. Raman Peaks at 275.49 cm−1 and 580.17 cm−1 corresponding to ZnO:N and ZnO:AlN were also observed.