کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1463105 | 989642 | 2013 | 6 صفحه PDF | دانلود رایگان |
Highly nanocrystalline ZnO modified methyl glycol thin films have been deposited on a p-type silicon substrate via the sol–gel spin coating manner. The morphology of the as-deposited film was scrutinized using scanning electron microscopy. I–V characteristics of the as-prepared ZnO film under vacuum and in open air were monitored. The results showed that the ZnO films have a barrier height of 0.38 eV under vacuum and 0.62 eV in open air. The Schottky barrier height between ZnO grains was determined for different reducing gases. The ZnO film showed high sensitivity to H2S gas compared with other reducing gases due to the reduction of barrier height between ZnO grains. The as-prepared ZnO film was annealed at four different temperatures. X-ray diffraction manifested that the wurtzite hexagonal structure of ZnO deviated from ideality at annealing temperature greater than 650 °C. The barrier height of ZnO film decreased due to the increase of annealing temperature up to 650 °C and then decreased. The results also confirmed that the change of barrier height strongly affected the sensitivity of ZnO film.
Journal: Ceramics International - Volume 39, Issue 5, July 2013, Pages 5025–5030