کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1469031 1510017 2014 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Low temperature deposited graphene by surface wave plasma CVD as effective oxidation resistive barrier
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Low temperature deposited graphene by surface wave plasma CVD as effective oxidation resistive barrier
چکیده انگلیسی


• Low temperature graphene coating by plasma CVD as oxidation resistive barrier.
• Graphene-coated Cu in atmospheric air shows Strong oxidation resistance performance.
• Synthesized graphene effectively passivates Cu surface to restrain oxygen reaction.
• The developed technique can be used for coating of various non-catalytic metals.

An effective approach for preserving the metal surface from oxidation and corrosion is of a great importance for various practical and industrial applications. Here, we demonstrate that graphene coating by surface wave plasma (SWP) chemical vapor deposition (CVD) technique at low temperature (∼450 °C) is promising as an oxidation resistive barrier of Cu foil. A strong oxidation resistance performance is obtained for the Cu foil heated in atmospheric conditions with robust surface passivation by the deposited graphene film. The developed process can be exploited for various types of metals as graphene growth is independent of catalytic ability of the metal surface and scalable by a roll-to-roll deposition process.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Corrosion Science - Volume 78, January 2014, Pages 183–187
نویسندگان
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