کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1470743 | 990333 | 2010 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Growth kinetics and mechanism of the initial oxidation of Al-based Al–Mg alloys
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Growth kinetics and mechanism of the initial oxidation of Al-based Al–Mg alloys Growth kinetics and mechanism of the initial oxidation of Al-based Al–Mg alloys](/preview/png/1470743.png)
چکیده انگلیسی
The relationship between the growth kinetics and the local chemical states of Al, Mg and O ions in ultrathin (<3 nm) oxide films grown on Al-based Al–Mg substrates at T = 300–610 K was established by ellipsometry and XPS. At T ⩽ 385 K, an Al-oxide film of near-limiting thickness (∼1 nm) is formed, which exhibits interfacial and bulk-like states for the Al cations. At T > 385 K, continued growth is realized by the preferential oxidation of interfacially segregated Mg, resulting in the sequential appearance of interfacial and bulk-like states for the Mg cations.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Corrosion Science - Volume 52, Issue 8, August 2010, Pages 2556–2564
Journal: Corrosion Science - Volume 52, Issue 8, August 2010, Pages 2556–2564
نویسندگان
E. Panda, L.P.H. Jeurgens, E.J. Mittemeijer,