A combinatorial passivation study of Ta–Ti alloys

A combinatorial study of the kinetics of anodic oxide formation was performed on a co-deposited Ta–Ti composition spread sample (from 2 to 76 at.% Ti). The samples were characterized by High Resolution Scanning Electron Microscopy (HRSEM) and Grazing Angle X-Ray Diffraction (GIXRD). High-throughput-screening was performed with an automated scanning-droplet-cell to anodise incrementally by cyclic voltammetry and perform electrochemical impedance spectroscopy. A comprehensive set of oxide parameters, including film formation factor, dielectric constant, specific oxide resistance, flat band potential and donor density was obtained. The observed changes could be directly correlated to the microstructure of the parent metal.