Semiconducting and passive film properties of nitrogen-containing type 316LN stainless steels

The semiconducting property of passive films of nitrogen-containing type 316LN stainless steels in different electrolytic media (0.5 M NaCl, borate buffer and borate buffer + 0.5 M NaCl) was investigated by electrochemical impedance spectroscopy (EIS). The nitrogen effect on the chemical composition of the passive films was investigated using X-ray photoelectron spectroscopy, (XPS). Based on capacitance results, the semiconducting parameters obtained from the Mott–Schottky plots indicated a decrease in the donor and acceptor density (ND and NA) with increase in nitrogen content, and variation in the flat band potential (EFB), depending on the electrolytic media. Thus indicating that the oxide layers of the passive film are modified by nitrogen addition. The presence of nitrogen and NH4+ in the passive film was confirmed by the XPS analysis of the passive film. Cyclic polarization for pitting and repassivation corrosion studies indicated a decrease in hysteresis loop with increase in nitrogen content in 0.5 M NaCl solution. In the highest nitrogen-containing alloy (0.556 wt.% N), the hysteresis loop was small and negligible indicating that the pit initiation is minimum in this alloy. Based on the results obtained, an attempt was made to correlate the semiconducting nature of the passive films with pitting corrosion resistance.