کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1476426 1510146 2007 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Multi-target reactive sputtering—A promising technology for large-area Pb(Zr,Ti)O3 thin film deposition
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Multi-target reactive sputtering—A promising technology for large-area Pb(Zr,Ti)O3 thin film deposition
چکیده انگلیسی

Beyond target diameters of 100 mm, multi-target reactive sputtering becomes a promising technology for ferroelectric thin film deposition. The main advantages of multi-target sputtering technology are: (i) thin films with precise composition control, (ii) stoichiometric variations on the target surface during repeated use are prevented by target preconditioning and operation in the metallic mode, and (iii) higher deposition rate due to sputtering from metals in the metallic mode. The latter requires a much greater precision in control of the partial pressure of oxygen, e.g., by a plasma emission monitor. In this work, Pb(Zr,Ti)O3 thin film deposition on 150 mm silicon wafers by an industrial system is demonstrated. This technology can be easily scaled-up for larger silicon wafers and is compatible with standard semiconductor technology. Films deposited onto ZrO2 buffer layers were polarized in-plane and they are suitable for piezoelectric MEMS application.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of the European Ceramic Society - Volume 27, Issues 13–15, 2007, Pages 3789–3792
نویسندگان
, , , , ,