Reflection intensity measurement using non-contact microwave probe and in-plane mappings for dielectric device

The reflection intensity measurement using non-contact microwave probe was carried out for multi-layer ceramic capacitor. The spatial resolution of non-contact microwave probe was improved the basis of Kirchhoff's diffraction formula with decreasing diameters of the coaxial cable and probe. Using Reflection intensity mappings, the dielectric permittivity distribution in micro-region at 9.4 GHz was measured for the cross-section of a multi-layer ceramic capacitor at room temperature. The spatial resolution was experimentally estimated to be about 10 μm from mappings of the dielectric and inner electrode layers in the multi-layer ceramic capacitor.