کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1483986 | 1510514 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Er-doped SiO2 films by rf magnetron co-sputtering
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
The magnetron sputtering assisted by radiofrequency is a versatile technique to obtain glass films doped with rare earths. Er:SiO2 systems are optical materials able to amplify an optical signal at λ = 1.54 μm (the most used wavelength in fiber glass for optical telecommunications). Different energy treatments of these materials were performed, both during and after the sputtering deposition synthesis, with the aim at optimizing the radiative emission. The best-performing Er:SiO2 samples obtained are characterized by a photoluminescence yield comparable to that of the best Er:SiO2 systems obtained by other synthesis techniques.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 355, Issues 18–21, 1 July 2009, Pages 1128–1131
Journal: Journal of Non-Crystalline Solids - Volume 355, Issues 18–21, 1 July 2009, Pages 1128–1131
نویسندگان
E. Cattaruzza, G. Battaglin, F. Visentin, E. Trave,