کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1484718 | 1510525 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Advanced deposition phase diagrams for guiding Si:H-based multijunction solar cells
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
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چکیده انگلیسی
Phase diagrams have been established to describe very high frequency (vhf) plasma-enhanced chemical vapor deposition (PECVD) of intrinsic hydrogenated silicon (Si:H) and silicon-germanium alloy (Si1âxGex:H) thin films on crystalline Si substrates that have been over-deposited with n-type amorphous Si:H (a-Si:H). The Si:H and Si1âxGex:H films are prepared under conditions used for the top and middle i-layers of high efficiency triple-junction a-Si:H-based n-i-p solar cells. Identical n/i cell structures were co-deposited in this study on textured (stainless steel)/Ag/ZnO which serve as substrate/back-reflectors in order to relate the phase diagrams to the performance parameters of single-junction solar cells. This study has reaffirmed that the highest efficiencies for a-Si:H and a-Si1âxGex:H solar cells are obtained when the i-layers are prepared under previously-described maximal H2 dilution conditions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 354, Issues 19â25, 1 May 2008, Pages 2435-2439
Journal: Journal of Non-Crystalline Solids - Volume 354, Issues 19â25, 1 May 2008, Pages 2435-2439
نویسندگان
J.A. Stoke, N.J. Podraza, Jian Li, Xinmin Cao, Xunming Deng, R.W. Collins,