کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1485443 | 1510543 | 2007 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fluorine laser-induced silicon hydride Si-H groups in silica
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Fluorine laser-induced silicon hydride Si-H groups in silica Fluorine laser-induced silicon hydride Si-H groups in silica](/preview/png/1485443.png)
چکیده انگلیسی
Formation and destruction of silicon hydride (Si-H) groups in silica by F2 laser irradiation and their vacuum ultraviolet (VUV) optical absorption was examined by infrared (IR) and VUV spectroscopy. Photoinduced creation of Si-H groups in H2-impregnated oxygen deficient silica is accompanied by a growth of infrared absorption band at 2250Â cmâ1 and by a strong increase of VUV transmission at 7.9Â eV. Photolysis of Si-H groups by 7.9Â eV photons in this glass was not detected when the irradiation was performed at temperature 80Â K. However, a slight destruction of Si-H groups under 7.9Â eV irradiation was observed at the room temperature. This finding gives a tentative estimate of VUV absorption cross section of Si-H groups at 7.9Â eV as 4Â ÃÂ 10â21Â cm2, showing that Si-H groups do not strongly contribute to the absorption at the VUV fundamental absorption edge of silica glass.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Non-Crystalline Solids - Volume 353, Issues 5â7, 1 April 2007, Pages 526-529
Journal: Journal of Non-Crystalline Solids - Volume 353, Issues 5â7, 1 April 2007, Pages 526-529
نویسندگان
Linards Skuja, Koichi Kajihara, Masahiro Hirano, Hideo Hosono,