کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1491562 | 992354 | 2008 | 7 صفحه PDF | دانلود رایگان |

Compositionally graded (Ba1−xSrx)TiO3 (BST) thin films, with x decreasing from 0.3 to 0, were deposited on Pt/Ti/SiO2/Si and Ru/SiO2/Si substrates by radio frequency magnetron sputtering technology. The microstructure and dielectric properties of the graded BST thin films were investigated. It was found that the films on Ru electrode have better crystallization, and that RuO2 is present between the Ru bottom electrode and the graded BST thin films by X-ray diffraction and SEM analysis. Dielectric measurement reveals that the graded BST thin films deposited on Ru bottom electrode have higher dielectric constant and tunability. The enhanced dielectric behavior is attributed to better crystallization as well as smaller space charge capacitance width and the formation of RuO2 that is more compatible with the BST films. The graded BST films on Ru electrode show higher leakage current due to lower barrier height and rougher surface of bottom electrode.
Journal: Materials Research Bulletin - Volume 43, Issue 3, 4 March 2008, Pages 700–706