Effect of thickness on the structural, electrical and optical properties of ZnO films

A series of ZnO films of different thickness have been deposited on glass substrates using sol–gel technique by varying the number of spin coatings and the effect of film thickness on the structural, electrical and optical properties have been investigated. The XRD results indicate that the full width at half maximum (FWHM) of the (0 0 2) diffraction peak and the strain along c-axis are decreased as the film is grown up to a thickness of 300 nm. Above 300 nm, the strain again becomes appreciable. The surface morphology shows that the grains become more uniform and bigger in size as the film thickness increases. Electrical result shows that although ZnO film with thickness of around 260 nm has the highest resistivity but is better for current conduction. The excitonic nature in the absorption spectrum becomes prominent for a film with thickness of around 260 nm. The band gap increases and then decreases as the film grows thicker.