کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1495990 992951 2011 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Fabrication of KTa0.65Nb0.35O3 film by pulsed laser deposition on glass substrate with various buffer layers
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Fabrication of KTa0.65Nb0.35O3 film by pulsed laser deposition on glass substrate with various buffer layers
چکیده انگلیسی

KTa0.65Nb0.35O3 (KTN) thin films were deposited on amorphous glass substrates using a range of single buffer layers such as indium tin oxide (ITO), zinc oxide (ZnO), 3 at% Al-doped ZnO (AZO), and 3 at% Ga-doped ZnO (GZO), as well as a variety of multi-buffer layers such as SrTiO3 (STO)/ITO, STO/ZnO, STO/AZO, and STO/GZO using a pulsed laser deposition system. All films showed a polycrystalline perovskite phase with the exception of all single buffer layers and STO/ITO multi-buffer layers. The STO buffer layer is important for crystallizing KTN films due to the similar lattice constant and same crystal structure. The optical transmittance of all films exhibited a transmittance ⩾90% in the wavelength range.


► We fabricated KTa0.65Nb0.35O3 (KTN) film on amorphous glass substrates with various buffer layers bypulsed laser deposition.
► The KTN films using multi-buffer layers including the SrTiO3 (STO) layer was obtained crystalline structure.
► The KTN/STO/Al doped ZnO and KTN/STO/Ga doped ZnO films can be suitable candidate as an electro-optic material.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optical Materials - Volume 34, Issue 1, November 2011, Pages 269–273
نویسندگان
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