کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1497930 1510833 2007 10 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Oxynitride perovskite LaTiOxNy thin films deposited by reactive sputtering
چکیده انگلیسی

This paper reports on the first study of structural and optical properties of reactively RF-sputtered lanthanum titanium oxynitride thin films using an original oxynitride LaTiO2N target and an argon–nitrogen mixture as reactive plasma. The depositions were carried out by varying the process parameters such as RF power, total pressure, argon and nitrogen rates and substrate temperature. Wavelength dispersive spectrometry (WDS), X-ray diffraction (XRD), scanning electron microscopy (SEM) and UV–visible spectroscopy show that titanate lanthanum oxynitride compounds can exist as a domain composition, LaTiOxNy. Films prepared in pure argon are oxide films, transparent, amorphous and insulating. Polycrystalline and [001]-textured oxynitride thin films, with different nitrogen contents, can be deposited on SrTiO3 substrates, depending on the sputtering conditions. As expected, the introduction of nitrogen in the coatings leads to a band gap narrowing. Oxynitrides' thin films are thus coloured and semiconductive.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Progress in Solid State Chemistry - Volume 35, Issues 2–4, 2007, Pages 299–308
نویسندگان
, , , , , ,