کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1499255 993300 2013 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices
چکیده انگلیسی

RuN films that crystallized in the ZnS-like structure with [1 1 1] preferred orientation have been deposited by reactive sputtering. Preliminary results are reported on the electrochemical properties of such films as electrode materials for supercapacitors and lithium-ion batteries. Cyclic voltammetric experiments indicate an attractive capacitance value of 37 F g−1. Moreover, galvanostatic measurements indicate that RuN films reversibly react with lithium through a conversion reaction with Ru(0) nanoparticle formation. A high capacity value of ∼700 mAh g−1 at C/2 rate is achievable.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 68, Issue 9, May 2013, Pages 659–662
نویسندگان
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