کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1502700 | 993430 | 2009 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سرامیک و کامپوزیت
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography Effect of the substrate on the thermodynamic properties of PdHx films studied by hydrogenography](/preview/png/1502700.png)
چکیده انگلیسی
We investigated the influence of the substrate on the thermodynamic properties of metal hydride thin films by hydrogenography, using PdHx as a model system. After appropriate hydrogen cycling, reproducible hydrogenation properties are found at the same equilibrium pressure for all substrates studied. Comparing these thin films with free-standing films—measured both by hydrogenography and by Sievert’s method—we find a very similar behavior. Hence, thin films can be used to study the hydrogenation behavior of the corresponding bulk materials.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Scripta Materialia - Volume 60, Issue 5, March 2009, Pages 348–351
Journal: Scripta Materialia - Volume 60, Issue 5, March 2009, Pages 348–351
نویسندگان
Y. Pivak, R. Gremaud, K. Gross, M. Gonzalez-Silveira, A. Walton, D. Book, H. Schreuders, B. Dam, R. Griessen,