کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1515866 | 1511538 | 2014 | 5 صفحه PDF | دانلود رایگان |
• Surface undulation of a thin film is energetically favourable.
• There is a critical wavelength determined by the minimum strain energy density.
• The critical wavelength is thickness-dependent.
• Surface undulation does not bring about noticeable residual stress relaxation.
This paper investigates the dependence of surface undulation on a film thickness considerably greater than the critical value of a thin film system. It considers that surface tension and residual stress are the main cause of surface undulation. The study found that there is a critical undulation wavelength that minimizes the free energy of a thin film system, that this critical wavelength depends on the film thickness, and the effect of undulation amplitude is insignificant. The research also found that the surface undulation has a negligible influence on the residual stresses in the thin film system.
Journal: Journal of Physics and Chemistry of Solids - Volume 75, Issue 4, April 2014, Pages 500–504