Preparation of pulse plated GaAs films

Thin GaAs films were prepared by pulse plating from an aqueous solution containing 0.20 M GaCl3 and 0.15 M As2O3 at a pH of 2 and at room temperature. The current density was kept as 50 mA cm−2 the duty cycle was varied in the range 10-50%. The films were deposited on titanium, nickel and tin oxide coated glass substrates. Films exhibited polycrystalline nature with peaks corresponding to single phase GaAs. Optical absorption measurements indicated a direct band gap of 1.40 eV. Photoelectrochemical cells were made using the films as photoelectrodes and graphite as counter electrode in 1 M polysulphide electrolyte. At 60 mW cm−2 illumination, an open circuit voltage of 0.5 V and a short circuit current density of 5.0 mA cm−2 were observed for the films deposited at a duty cycle of 50%.