کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1528639 1511972 2015 7 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Bipolar resistive switching and charge transport in silicon oxide memristor
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Bipolar resistive switching and charge transport in silicon oxide memristor
چکیده انگلیسی


• Si-based thin-film memristor structure was fabricated by magnetron sputtering.
• We study bipolar resistive switching and charge transport mechanisms.
• Resistive switching parameters are determined by a balance between redox reactions.

Reproducible bipolar resistive switching has been studied in SiOx-based thin-film memristor structures deposited by magnetron sputtering technique on the TiN/Ti metalized SiO2/Si substrates. It is established that, after electroforming, the structure can be switched between the quasi-ohmic low-resistance state related to silicon chains (conducting filaments) and the high-resistance state with semiconductor-like hopping mechanism of charge transport through the defects in silicon oxide. The switching parameters are determined by a balance between the reduction and oxidation processes that, in turn, are driven by the value and polarity of voltage bias, current, temperature and device environment. The results can be used for the development of silicon-based nonvolatile memory and memristive systems as a key component of future electronics.

Figure optionsDownload as PowerPoint slide

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science and Engineering: B - Volume 194, April 2015, Pages 48–54
نویسندگان
, , , , , , , , , , , ,