کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1529588 | 1511990 | 2010 | 4 صفحه PDF | دانلود رایگان |
Ni-doped CdS thin films were prepared by 90 keV Ni+ implantation at room temperature. Ni-ion implantation induced modifications in structural, optical, and morphological properties are studied for a wide range of impurity concentrations (1.86–10.19 at.%). Addition of Ni+ ions does not lead to any structural phase transformation or formation of metallic clusters or secondary phase precipitates. However, it induces structural disorder leading to a reduction in the optical band gap from 2.39 to 2.28 eV following Ni implantation up to 3 × 1016 ions cm−2. This is addressed on the basis of band tailing due to the creation of localized energy states and implantation induced grain growth. Moreover, Ni-doping is found to modify the luminescence properties by creating shallow acceptor states.
Journal: Materials Science and Engineering: B - Volume 171, Issues 1–3, 25 July 2010, Pages 16–19