Study of (1Â 0Â 0) orientated ZnO films by APCVD system

ZnO thin films were grown on glass substrate by Atmospheric Pressure Chemical Vapor Deposition system (APCVD), using zinc acetate (Zn(CH3COO)2) as precursor of Zn. The solution was prepared with zinc acetate in ammonium hydroxide (NH4OH). Ozone was used as an oxidant agent to obtain ZnO films. The aqueous solution of zinc acetate was bubbled with nitrogen flow into the reaction chamber. The structural and optical properties of ZnO films were investigated in different deposition temperatures (300-375 °C in steps of 25 °C). X-ray diffraction results show that all deposited films were polycrystallined in (1 0 0) preferred orientation. Our samples showed a transmittance bigger or similar to 80% in the visible region. Preliminary studies show that the room-temperature photoluminescence spectrum of all films exhibits a strong peak in visible region at 492.31 nm.