The thermal-stress accumulation in anti-reflective coatings with multi-pulse laser irradiation

• The laser-induced damage threshold of single-layer film and high-reflective film are measured easily for their simple structure.
• Therefore, the thermal-stress study is often carried out in single-layer or high-reflective film.
• On the contrary, the thermal-stress in anti-reflective coating is rarely discussed.
• The temperature and stress inside an antireflection coating is researched.

An analysis model is established to study the accumulation processes of temperature and stress in an anti-reflective coating with multi-pulse laser irradiation. Specifically, the influence of pulse interval on the thermal-stress accumulation effects is discussed in detail. Furthermore, the accumulations of temperature and stress dependence of pulse energy are discussed. The results show that stress has the same accumulation rules as temperature. The pulse interval has major impact on the accumulation process. When the time of pulse interval is close to the cooling time of material, the accumulation effect is not obvious. Furthermore, the accumulations of temperature and stress are more obvious with increasing pulse energy.