Third-order polymer waveguide Bragg grating array by using conventional contact lithography

A very simple and cheap fabrication process by using the conventional contact lithography is proposed to realize the third-order polymer waveguide Bragg grating array. Large area periodic grating structure was formed in the bottom cladding first, followed by the multiple channel waveguides fabricated on top of it, polymer waveguide Bragg grating array working at around 1550 nm was obtained. The fabricated polymer waveguide Bragg grating array was optically characterized by reflection spectra measurement in the telecom range 1530–1560 nm. The reflectivity, 3 dB bandwidth and insertion loss are about 25 dB, 1 nm and −8~−10 dB respectively. The measured transmission spectra are in accordance with the numerical simulation results well and have good uniformity.