کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1536866 | 996575 | 2012 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Rhombohedral photonic crystals by triple-exposure interference lithography: Complete photonic band gap
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The band structure of 3D photonic crystal that could be synthesized by means of interference lithography with triple-exposure two-beam interference technique has been investigated. As a result of the geometry optimization the optimal conditions for maximal band gaps with different refractive index contrast have been obtained. The refractive index threshold for gap opening equaled to 2.14 has been predicted for this method of photonic crystals synthesis. This value is close to the refractive index thresholds of the best known structures. The continuous transition between simple cubic, face centered cubic and bulk centered cubic symmetries has been considered.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics Communications - Volume 285, Issue 6, 15 March 2012, Pages 1238–1241
Journal: Optics Communications - Volume 285, Issue 6, 15 March 2012, Pages 1238–1241
نویسندگان
Nataliya D. Kundikova, Yuri V. Miklyaev, Denis G. Pikhulya,