کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1537090 | 996580 | 2011 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Simulation study of ‘perfect lens’ for near-field nanolithography
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Simulation study of ‘perfect lens’ for near-field nanolithography Simulation study of ‘perfect lens’ for near-field nanolithography](/preview/png/1537090.png)
چکیده انگلیسی
The near-field perfect lens (NFPL) in imaging chrome gratings is investigated by using finite difference time domain (FDTD) method. The surface plasmon focused effect in and beneath the NFPL layer is demonstrated. The effects of the grating parameters and NFPL permittivity on image fidelity are explored. It is found that the excitation of surface plasmons results in frequency-increased images at large duty cycles and small imaginary part of NFPL permittivities. It is also shown that maximum intensity distributions on image plane occur at some specified pitches and duty cycles. The physics mechanisms are presented to explain these phenomena.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics Communications - Volume 284, Issue 19, 1 September 2011, Pages 4360–4365
Journal: Optics Communications - Volume 284, Issue 19, 1 September 2011, Pages 4360–4365
نویسندگان
Xiaowei Guo, Qiming Dong, Yong Liu,