کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1537090 996580 2011 6 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Simulation study of ‘perfect lens’ for near-field nanolithography
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
Simulation study of ‘perfect lens’ for near-field nanolithography
چکیده انگلیسی

The near-field perfect lens (NFPL) in imaging chrome gratings is investigated by using finite difference time domain (FDTD) method. The surface plasmon focused effect in and beneath the NFPL layer is demonstrated. The effects of the grating parameters and NFPL permittivity on image fidelity are explored. It is found that the excitation of surface plasmons results in frequency-increased images at large duty cycles and small imaginary part of NFPL permittivities. It is also shown that maximum intensity distributions on image plane occur at some specified pitches and duty cycles. The physics mechanisms are presented to explain these phenomena.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics Communications - Volume 284, Issue 19, 1 September 2011, Pages 4360–4365
نویسندگان
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