کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1537127 | 996580 | 2011 | 7 صفحه PDF | دانلود رایگان |
High brightness Extreme Ultraviolet (EUV) sources for laboratory operation are needed in nano-fabrication and actinic (“at-wavelength”) inspection of the masks for high volume manufacturing in next generation lithography. Laser-plasma EUV sources have the required compactness and power scalability to achieve the demanding requirements. However, the incoherent emission lacks the brightness for single-shot high contrast imaging. On the other hand, fully coherent sources are considered to be unsuitable for full-field sample illumination and prone to speckles. We evaluate the capabilities of a lab-scale amplified-spontaneous-emission (ASE) EUV laser source to combine brightness and high quality imaging with full-field imaging, along with rapid acquisition and compactness.
Journal: Optics Communications - Volume 284, Issue 19, 1 September 2011, Pages 4577–4583