کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1538818 | 996622 | 2010 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Polarization-selective subwavelength grating used with 193 nm light
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
مواد الکترونیکی، نوری و مغناطیسی
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Polarization-selective subwavelength grating used with 193 nm light Polarization-selective subwavelength grating used with 193 nm light](/preview/png/1538818.png)
چکیده انگلیسی
Hyper-NA ArF (193 nm) immersion lithography is one of the most potential technologies to achieve 32 nm critical dimension node. At the corresponding large angles in the photoresist, control of polarization becomes necessary. A polarization beam splitter (PBS) based on a subwavelength dielectric grating has been designed for use with 193 nm light. The polarization-selective property of such grating is explained by the mechanism of mode interference. The designed grating working as a 1 × 2 beam splitter can transmit TM wave (∼ 90%) to the zeroth order with extinction ratio of 753, and it diffracts TE wave (∼ 80%) to the −1st order with extinction ratio of 300.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Optics Communications - Volume 283, Issue 22, 15 November 2010, Pages 4531–4535
Journal: Optics Communications - Volume 283, Issue 22, 15 November 2010, Pages 4531–4535
نویسندگان
Guo Guo Kang, Qiao Feng Tan, Guo Fan Jin,