Research on the optical field distribution and micro-fabrication model in convex-surface laser lithography

A system of convex-surface laser lithography with diode laser is established in this paper. Based on this system, a mathematical model of optical field distribution and lithography on the photoresist layer of convex-surface substrate with diode laser is presented. According to the lithography system and model, some numerical simulations are carried out. The simulation result shows that lithographic lines on convex-surface lithography are not symmetric about the optical axis of incident laser beam. Axis of lines at different vector radius on convex-surface substrate will offset from the wavefront normal of incident laser beam. The offset distance depends on the slopes of different equivalent slants. The simulative results of lithographic model agree well with the lithographic experimental data.