TiO2 thin films – Influence of annealing temperature on structural, optical and photocatalytic properties

Nanostructured TiO2 thin films were deposited on glass substrates by sol–gel dip coating technique. The structural, morphological and optical characterizations of the as deposited and annealed films were carried out using X-ray diffraction (XRD), Raman spectroscopy, atomic force microscopy (AFM), and UV–vis transmittance spectroscopy. As-deposited films were amorphous, and the XRD studies showed that the formation of anatase phase was initiated at annealing temperature close to 400 °C. The grain size of the film annealed at 600 °C was about 20 nm. The lattice parameters for the films annealed at 600 °C were a = 3.7862 Ǻ and c = 9.5172 Ǻ, which is close to the reported values of anatase phase. Band gap of the as deposited film was estimated as 3.42 eV and was found to decrease with the annealing temperature. At 550 nm the refractive index of the films annealed at 600 °C was 2.11, which is low compared to a pore free anatase TiO2. The room temperature electrical resistivity in the dark was of the order of 4.45 × 106 ohm-cm. Photocatalytic activity of the TiO2 films were studied by monitoring the degradation of aqueous methylene blue under UV light irradiation and was observed that films annealed above 400 °C had good photocatalytic activity which is explained as due to the structural and morphological properties of the films.