کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1563581 999614 2007 9 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Transient hole formation during the growth of thin metal oxide layers
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مکانیک محاسباتی
پیش نمایش صفحه اول مقاله
Transient hole formation during the growth of thin metal oxide layers
چکیده انگلیسی

Using a quinternary variable charge molecular dynamics simulation technique, we have discovered a transient hole formation phenomenon during oxidation of thin aluminum layers on Ni65Co20Fe15 substrates. Holes were found to first develop and expand at the earliest stage of the oxidation. These holes then shrank and finally disappeared as oxidation further proceeded. Thermodynamic analysis of the hole healing indicated that it is accompanied by a significant decrease in system potential energy. This suggests that the effect is largely driven by thermodynamics and is less related to the flux shadowing or kinetically introduced island coalescence. The simulations provide insights for the growth of dielectric tunnel barrier layers with reduced layer thicknesses.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Computational Materials Science - Volume 39, Issue 4, June 2007, Pages 794–802
نویسندگان
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