کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1564309 999640 2007 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
An analysis of a tensile nanoindentation process for film/substrate systems
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مکانیک محاسباتی
پیش نمایش صفحه اول مقاله
An analysis of a tensile nanoindentation process for film/substrate systems
چکیده انگلیسی

Here we present an in-depth analysis of a tensile nanoindentation process to measure Young’s modulus and yield strength of nanofilms and materials under tensile loading. The proposed methodology utilizes a truncated conical indenter and an upwardly obtruded well-shaped tube structure from substrate. It has been numerically shown that the maximum indentation load and unloading slope are independent of contact area over a fairly large range of indenter stroke. The apparent correlation between load–displacement result and material properties in the tensile nanoindentation has been understood in terms of a modified thick-walled cylinder model, based upon the assumption of frictionless and uniform radial expansion of the film. When the model parameters were determined numerically, the modified cylinder model predicted Young’s modulus and yield strength of nanofilms close to the results of the finite element analysis, indicating that the newly proposed nanoindentation process is not far away from the behavior of the modified thick-walled cylinder and that a necessity exists to refine the model parameters.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Computational Materials Science - Volume 40, Issue 3, September 2007, Pages 400–407
نویسندگان
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