Simultaneous probing of phase transformations in Ni-Ti thin film shape memory alloy by synchrotron radiation-based X-ray diffraction and electrical resistivity

Nickel–Titanium (Ni–Ti) thin film shape memory alloys (SMAs) have been widely projected as novel materials which can be utilized in microdevices. Characterization of their physical properties and its correlation with phase transformations has been a challenging issue. In the present study, X-ray beam diffraction has been utilized to obtain the structural information at different temperatures while cooling. Simultaneously, electrical resistivity (ER) was measured in the phase transformation temperature range. The variation of ER and integral area of the individual diffraction peaks of the different phases as a function of temperature have been compared. A mismatch between the conventional interpretation of ER variation and the results of the XRD data has been clearly identified.

► Phase transformation characterization of Ni–Ti thin film SMA has been carried out.
► Simultaneous monitoring of the XRD and ER with temperature is performed.
► The variation of ER and integral area of the diffraction peaks have been compared.
► A shift of the transformation temperatures obtained by two techniques is discussed.