کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1572062 1514425 2009 8 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structural characterization of TiN coatings on Si substrates irradiated with Ar ions
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
Structural characterization of TiN coatings on Si substrates irradiated with Ar ions
چکیده انگلیسی
The present study deals with TiN/Si bilayers irradiated at room temperature (RT) with 120 keV Ar ions. The TiN layers were deposited by d.c. reactive sputtering on Si(100) wafers to a thickness of ∼ 240 nm. After deposition the TiN/Si bilayers were irradiated to the fluences of 1 × 1015 ions/cm2 and 1 × 1016 ions/cm2. Structural characterization was performed with Rutherford backscattering spectroscopy (RBS), cross-sectional transmission electron microscopy (XTEM), grazing angle X-ray diffraction (XRD) and atomic force microscopy (AFM). The results showed that the variation of the lattice constants, mean grain size and micro-strain can be attributed to the formation of the high density damage region in the TiN film structure. It has been found that this damage region is mainly distributed within ∼ 100 nm at surface of the TiN layers.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Characterization - Volume 60, Issue 12, December 2009, Pages 1463-1470
نویسندگان
, , ,