کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
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1586200 | 1515068 | 2015 | 5 صفحه PDF | دانلود رایگان |
Block copolymers have been widely studied over the last few decades because of their ability to self-assemble into well-ordered nanoscale structures. Here, we present a novel approach to fabricate nanostructures using block copolymer thin films as three-dimensional nanomasks. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) are coated in the nanopores of anodic aluminum oxide (AAO) templates via solvent-vapor induced wetting. The morphologies of the block copolymer thin films coated on the nanopores are controlled by the annealing solvents. The PDMS domains of the coated PS-b-PDMS thin films can then be etched selectively using HF solutions, and the patterns of the block copolymers can be transferred to the nanopore walls.
Three-dimensional nanomasks using block copolymers have been developed. PS-b-PDMS thin films are coated in the nanopores of anodic aluminum oxide templates via solvent-vapor induced wetting. The patterns of the block copolymers can be transferred to the nanopore walls by etching with a HF solution. The etched template can then be used to fabricate polymer, metal, and inorganic nanostructures with special surface morphologies.Figure optionsDownload as PowerPoint slide
Journal: Materials Today Communications - Volume 3, June 2015, Pages 52–56