کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1590963 | 1515472 | 2006 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Fabrication of high-aspect-ratio arrayed structures using Si electrochemical etching
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
![عکس صفحه اول مقاله: Fabrication of high-aspect-ratio arrayed structures using Si electrochemical etching Fabrication of high-aspect-ratio arrayed structures using Si electrochemical etching](/preview/png/1590963.png)
چکیده انگلیسی
Subsequently the surface of the pores was thermally oxidized to form SiO2 layers, and arrayed glass tubes with picoliter volume were fabricated. On the other hand, the pore filling with metal was attempted using electrodeposition to obtain array of the metal needles. For this, the “single batch” process was developed to form the pore array and metal filling with single electrolyte, and array of metal micro needles was successfully formed. These processes demonstrated capability and possibility of the electrochemical processes for microscale fabrication, and further precise processes can be developed using these approaches.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Science and Technology of Advanced Materials - Volume 7, Issue 5, July 2006, Pages 468-474
Journal: Science and Technology of Advanced Materials - Volume 7, Issue 5, July 2006, Pages 468-474
نویسندگان
Hirotaka Sato, Takayuki Homma,