کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1630414 | 1516666 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Structural and mechanical properties of amorphous carbon films deposited by the dual plasma technique
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فلزات و آلیاژها
پیش نمایش صفحه اول مقاله

چکیده انگلیسی
Direct current metal filtered cathodic vacuum arc (FCVA) and acetylene gas (C2H2) were wielded to synthesize Ti-containing amorphous carbon films on Si (100). The influence of substrate bias voltage and acetylene gas on the microstructure and mechanical properties of the films were investigated. The results show that the phase of TiC in the (111) preferential crystallographic orientation exists in the film, and the main existing pattern of carbon is sp2. With increasing the acetylene flow rate, the contents of Ti and TiC phase of the film gradually reduce; however, the thickness of the film increases. When the substrate bias voltage reaches â600 V, the internal stress of the film reaches 1.6 GPa. The micro-hardness and elastic modulus of the film can reach 33.9 and 237.6 GPa, respectively, and the friction coefficient of the film is 0.25.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of University of Science and Technology Beijing, Mineral, Metallurgy, Material - Volume 15, Issue 5, October 2008, Pages 622-626
Journal: Journal of University of Science and Technology Beijing, Mineral, Metallurgy, Material - Volume 15, Issue 5, October 2008, Pages 622-626
نویسندگان
Yaohui Wang, Xu Zhang, Xianying Wu, Huixing Zhang, Xiaoji Zhang,