Effect of Boron Doping on the Kinetics of Mullite Thin Films Transformation

Sol-gel based thin films doped with borate. These films deposited on copper substrates via a spin coating method. The ratio of prepared films were Al:Si:B=3:1:0.5 respectively. The doped mullite films annealed at 350oC for two time intervals 1hr and 2hr. The effect of boron doping on the kinetics of mullite transformation studied by XRD revealed orthorhombic mullite formation in prepared films. However, the surface morphology has uniformity without cracks. Thus, the stoichiometry of films was confirmed by EDX.