کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1631151 | 1006618 | 2015 | 7 صفحه PDF | دانلود رایگان |

Thin films of amorphous vanadium metal were deposited on a glass substrate using the electron beam evaporator, these thin films were thenexposed to a focused1064 nm wavelengthnanosecond laser pulses. The laser fluence was selected such that it was below the ablation threshold of the films, x-ray diffraction measurementrevealedthe formation of an oxide phase of vanadium after the laser exposure.The time of flight-secondary ion mass spectrometry data analysisshowed a uniform elemental distribution of the elements on the films, whereas the Rutherford backscattering spectrometry results showed that the concentration of oxygen as a function of the laser fluence wasincreasing, hinting to the incorporation of the oxygen atoms in the films as the laser fluenceincreases. UV-Vis-NIRpercentage reflectance measurements showed small evolution in the visible part of the spectrum due to laserexposure.
Journal: Materials Today: Proceedings - Volume 2, Issue 7, 2015, Pages 3950-3956