کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1641434 1517214 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Controlled thermal oxidation of nanostructured vanadium thin films
ترجمه فارسی عنوان
اکسیداسیون حرارتی کنترل شده از ورقه های نازک نانو ساختار وانادیم
کلمات کلیدی
رسوب زاویه دید اکسید وانادیوم، مقاومت در خلاء
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی


• Pure vanadium thin films were GLAD deposited with incident angles of 0, 20 and 85°.
• The films were annealed in atmospheric pressure (air) and vacuum conditions.
• The resistivity evolution was monitored with increasing annealing temperatures.
• Metallic-like electrical properties and columnar features are preserved in vacuum.
• VO2 phase is formed in air for α=0 and 85° samples.

Pure V thin films were dc sputtered with different pressures (0.4 and 0.6 Pa) and particle incident angles α of 0°, 20° and 85°, by using the GLancing Angle Deposition (GLAD) technique. The sputtered films were characterized regarding their electrical resistivity behaviour in atmospheric pressure and in-vacuum conditions as a function of temperature (40–550 °C), in order to control the oxidation process. Aiming at comprehending the oxidation behaviour of the samples, extensive morphological and structural studies were performed on the as-deposited and annealed samples. Main results show that, in opposition to annealing in air, the columnar nanostructures are preserved in vacuum conditions, keeping metallic-like electrical properties.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 174, 1 July 2016, Pages 162–166
نویسندگان
, , , , ,