Morphology-controllable fabrication and enhanced field emission of multilayer graphene–silicon nanowire composites

• Multilayer graphene–silicon nanowire (MLG–SiNW) composites were prepared.
• The morphology of MLG–SiNW composites can be readily controlled.
• MLG–SiNW composites have ultralow turn-on electric field.
• MLG–SiNW composites have excellent field emission stability.

Multilayer graphene–silicon nanowire (MLG–SiNW) composites were prepared by using microwave plasma enhanced chemical vapor deposition and their field emission (FE) characteristics were studied. The morphology of MLG–SiNW composites can be readily controlled by tuning the concentration of carbon source and the microwave power. The FE study indicates that MLG–SiNW composites have superior FE performance to that of SiNWs. MLG–SiNW composites with optimal morphology exhibit excellent FE properties. They have a low turn-on electric field of 2.42 V/μm and also have good FE stability. We consider that both the large aspect ratio of SiNWs and the unique structure of MLGs are responsible for the enhanced FE properties.

Multilayer graphene–silicon nanowire (MLG–SiNW) composites were prepared by using microwave PECVD and their field emission properties were studied. Composites with optimal morphology were found to have an ultralow turn-on electric field and excellent field emission stability. Figure optionsDownload as PowerPoint slide