Formation of Ti2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si3N4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure Mn + 1AXn-phase Ti2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.

► A multilayer system of Ti and AlN was deposited to form the Mn + 1AXn-phase Ti2AlN.
► The single layer thickness was according to the stoichiometrical requirements.
► Subsequent rapid thermal annealing led to the formation of Ti2AlN.
► X-ray diffraction, GDOES and high resolution TEM confirmed the gained phase.